Brewer Science has introduced two new etch protective coating products for MEMS fabrication which is an industry-first photo definable protective mask for deep silicon etching, and an improved blanket protection coating product for use in hot KOH etching processes. These new products represent a major improvement in etch protection over older-generation products through their ability to withstand prolonged etching in hot alkaline media with little or no discernible lifting. This is due to the development of a specialized spin coating system for applying a polymeric coating continuously from one side of the wafer, around the wafer bevel, and onto the back-side as a means for protecting the wafer edge from chemical attack and the coating system is made available to customers in a bench top instrument format.