With this microscope tiny structures as small as one nanometer can be visualize in small objects. The FESEM is employed by scientists to study a great variety of objects, like cellular organelles, synthetic polymers and coatings on microchips. FESEM does not work with light (photons) but with electrons. Electrons are generated in a 'source' (Emission) and accelerated under influence of a strong electrical voltage gradient (Field). With electromagnetic coils an electron beam is formed that scans the object (Scan) and secondary electrons are produced by interaction with the atoms at the surface of the sample. These electrons contain valuable information that is employed to reconstruct a very detailed image of the topography of the surface of the specimen.Applications include the semiconductor device cross section analyses for gate widths, gate oxides, film thicknesses, and construction details, advanced coating thickness and structure uniformity determination, small contamination feature geometry and elemental composition measurement. FESEM produces clearer, less electro statically distorted images that is several times better than conventional SEM. High quality, low voltage images can be obtained with negligible electrical charging of samples. There is no need for placing conducting coatings on insulating materials.